用HF +HNO3 溶液蚀刻单晶硅表面,通过扫描电镜表征其形貌和厚度变化,研究了蚀刻液浓度、蚀刻时间及温度对单晶硅化学蚀刻行为的影响-Etched with HF+ HNO3 solution, silicon surfaces by scanning electron microscopy to characterize the morphology and thickness, the concentration of the etching solution, etching time a

模拟大气气体污染扩散程度，输出三维立体图，算出不同点对应浓度- Simulated atmospheric gas pollution diffusion degree, the output 3 d stereogram, calculate the difference between the corresponding concentration

温室大棚内的环境信息监测，包括温度、湿度、光照度、CO2浓度，并可对温室卷帘、通风等进行手动及自动控制-Greenhouses in the environmental monitoring information, including temperature, humidity, light, CO2 concentration, and the greenhouse shade, ventilation and other manual and automatic control

印痕分析工具 可以用来分析大气湍流的影响范围。-The ART Footprint Tool Flux and concentration footprint modelling